SPIE Astronomical Instrumentation
23-28 June 2008
Parc Chanot Marseille
France

Booth 219

OPTO 2008
Sept. 30 - Oct. 1&2
Paris - North Villepinte
France

Hall 1&2 - Booth 1F8

Photonics West
January 27-29, 2009
Convention Center, San Jose
CA, USA

South Hall, Booth 6142

Rousset-Peynier, France, September 2006

SILIOS Technologies awarded €238,000 for collaborative research in the European project PLASMOCOM.

Smaller and Smarter Photonic Components ? Go plasmonic !

PLASMOCOM Press Release 9 September 2006

The European Commission 6 Framework Programme project Polymer-based Nanoplasmonic Components and Devices (PLASMOCOM, http://www.plasmocom.org) has been launched on 1 September 2006. This Specific Targeted Research Project (STREP) in Information Society Technologies Priority brings together leading European laboratories in the field of plasmonics and a French company specialized in micro-optical components under the umbrella of a common task: to develop and implement novel concepts for micro- and nano-scale dynamic and active photonic components based on metal/polymer nanostructures. By utilizing the unique properties of metallic systems that allow both optical and electrical signals to be transmitted along the same metallic circuitry, this approach will provide a route to innovative integrated components combining photonics and electronics on the same chip.

The proposed technology makes use of surface plasmon polaritons—electromagnetic excitations that propagate along and are bound to an interface between a metal and a dielectric. These surface electromagnetic waves enable the manipulation of optical signals on a sub-wavelength scale and, therefore, are uniquely suitable for applications in integrated photonics circuits and the development of electronically-driven and all-optical photonic devices. Advances in this field will pave the way to a novel class of scalable photonic components which are compatible with current photonic and electronic technologies and create a new class of hybrid optical/electronic devices.

The project target is to establish a new technological platform and create the technology to integrate nanophotonic components with enhanced functionality for optical signal processing, on-electronic-chip optical interconnects and broadband optical applications. PLASMOCOM will create new critical knowledge on the fabrication and performance of dynamic and active nanophotonic devices, demonstrate new devices with enhanced parameters (inexpensive fabrication, smaller size, enhanced dynamic and active functionality having both lower electric power consumption and intensity of control light) and will contribute to Europe’s competitiveness and leadership in the miniaturization of photonic components and integrated photonic circuits.

The PLASMOCOM consortium is co-ordinated by the Queen's University of Belfast (UK) and includes the research groups Lazer Zentrum Hannover eV (Germany), the Aalborg University (Denmark) and the University of Bourgogne (France) as well as the planar optics specialist, SILIOS Technologies (France).

Courtesy Laser Zentrum Hannover eV

Courtesy IAP

Rousset-Peynier, France, January 2006

SILIOS Technologies awarded €334,000 for collaborative research in the European project DELILA.

This STREP on "Development of Lithography Technology for Nanoscale Structuring of Materials Using Laser Beam Interference (DELILA)" is supported by European Community funding from the Sixth Framework Programme and directly addresses the IST research areas "Technologies and devices for micro/nano-scale integration" and "Nanoelectronics".

The main aim of DELILA is the development and application of multiple beam interference lithography technology for nanoscale 2D and 3D structuring of materials in nano photonics, electronics and fabrication.

The project has three objectives:

- fundamental exploration of multiple beam interference lithography and its capabilities. This will include the conclusions on the formation of multiple beam interference patterns for nanolithography, interaction with different materials and boundary conditions, and environmental effects on the performance of interference lithography.

- develoment of computer software for the analysis of interference of several coherent beams of laser radiation and for the calculation of the results of diffraction of the radiation by periodic structures of different forms. This will lead to the synthesis and optimization of laser-beam characteristics for obtaining the required parameters of the created structures.

- development of the DELILA system. The main outcome of the project will be a nano fabrication tool that has the potential to create a breakthrough in nanolithography technology for both 2D and 3D structuring of materials.

The project partners of SILIOS are:

- Manufacturing Engineering Centre (MEC), Cardiff University, UK (coordinator)

- Institute of Applied Physics, Russian Academy of Sciences (IAP), Russia

- Optoelectronics Research Centre, Tampere University of Technology (ORC), Finland

- Department of Microelectronics, Centro de Estudios e Investigaciones Técnicas de Gipuzkoa (CEIT), 

  Spain

"La Lettre Mensuelle", Commercial support - CAP Japan - December 15th, 2005

New trading partners in view for SILIOS Technologies.

Takako Suzuki, commercial support, CCIFJ (press cutting)

At the beginning of December 2005, in collaboration with the Chamber of Commerce and Industry of Paris (CCIP) and the French Chamber of Commerce and Industry of Japan (CCIFJ), SILIOS technologies carried out a first prospecting mission in Japan in order to find local partners to tackle the market.

Japanese interlocutors were impressed by SILIOS unique and innovative technologies.

"Ten meetings were organized by the CCIFJ with companies in optics and instrumentation" M. Thierry Berthou, Sales Manager of SILIOS on this mission, comments on. "Among these ones, four appear really interesting for SILIOS and seem to be potential partners. This mission was very positive for us because, besides the discovering of potential distributors, it made it possible to evaluate the good potential of the Japanese market and to discover that there is little competition in Japan for these products".

Courtesy ESO

Rousset-Peynier, France, November 5th, 2004
SILIOS Technologies provides Phase Screens to ESO.
The French company SILIOS technologies continues its development in the field of microoptical components (diffractive optical elements, phase or amplitude plates and mirrors).
It has just delivered Phase Screens to E.S.O (European Southern Observatory) for the simulator of atmospheric turbulence MAPS (Multi- Atmospheric Phase Screen and Stars). This tool simulates the atmosphere disturbances to the zenith of the VLT and thus makes it possible to test adaptive optics systems in laboratory before their installation in Chile. The phase profiles are encoded on 100-mm diameter substrates and etched between 32 to 64 levels. The amplitude of the phase variations (peak to valley) reaches 8 microns. These screens allow to work in a broad range of wavelengths (500-2500 nm) with a very good transmission (T>84% without anti-reflecting treatment) and a reduced chromaticity (Dn ~2% on the spectral range). Lastly, because of their design, they are very stable and time reliable.

Three other European laboratories in Astronomy also placed order to SILIOS for this type of products.
The company makes profitable this knowledge to produce mirrors and phase plates in the high power lasers field. It provides components for spatial intra or extra laser cavity beam shaping, passive correction of wavefront or beam homogenisation.

October 4-8, 2004: SILIOS TECHNOLOGIES took part in a business convention organised by OpticsValley in the heart of the North-American optics-photonics cluster: the Photonics Center at Boston University.
Personalised meetings were organised between the French delegation companies and key actors of the sector including industrialists and research centres.

Laurent Roux, CEO of SILIOS, in particular met laboratories managers of the M.I.T (Massachusetts Institute of Technology).
The interest that was aroused by SILIOS I3O® technology (innovative concept in the manufacture of planar integrated optical components) during this mission encourages the company to start its commercial development in the United States.

SILIOS Technologies, which recently spun off from Ion Beam Services (IBS) to develop an innovative planar technology for Integrated Optics, today announces that it has secured €1,3 million in a first round financing from Vizille Capital Innovation, TechFund Capital Europe, Primaveris and 123 Multinova.
The proceeds will be used to further develop its patented I3O® (Ion Implanted Integrated Optics) technology and to market a new generation of passive optical integrated components for telecommunication.

“The cutting-edge technology I3O® enables to design and manufacture Planar Lightwave Circuits (PLC) that will know to match the new requirements of optical networks: low cost, miniaturization, high capability of integration.” explains Laurent Roux, CEO of SILIOS.

In spite of the funding slowdown in high tech, investors' vote of confidence in SILIOS team relies on a promising business plan. According to Alain Benisty, General Manager of Vizille Capital Innovation, “SILIOS Technologies is on the right track to become, 2 years from now, a serious player in the manufacturing of passive optical components.

Indeed this start-up has developed a promising technology with limited spending. Moreover, assets such as being close to IBS and the high quality of the technical team directed by an industrial manager, should ensure its success as soon as the market recover”.

Jean-Michel Barbier, Managing Partner of TechFund Capital Europe, adds: “SILIOS Technologies is developing a disruptive technology that we expect will have a solid impact on its market. Moreover, SILIOS team gathers a unique technical experience, from R&D to industrialization. That is the reason why we committed to the project, in spite of the depressed market conditions today. Our mission as an early stage investor, in difficult times as ever, is to identify the next upcoming technologies with great market and growth potential”.
In addition to the optical networks market, I3O® advantages like varying refractive index, mode field management and easy coupling make it also ideal for waveguides used in datacom, biophotonic and sensor applications.