You are working in either industry or research and involved with micro-machining, medical, security, astronomy, space or defence applications.
You are working with lasers such as Nd:Yag, CO2, Excimer, Femtosecond or Laser Diode and you want to enhance the optical functions of your equipment to get higher density, uniformity or efficiency.
We can offer a wide range of customised solutions to improve your results:
Diffractive Optical Elements (DOE)
Diffractive Optical Elements are used to shape an incident laser beam and
implement a desired function like points focusing, homogenising, collimating, patterning… Technologies
Our products: - Beam splitter (or fan-out): used to split a single input laser beam in several output laser beams according to a defined diffraction pattern (spot array, dot matrix). - Beam shaper: used to shape a gaussian laser beam in a Top Hat, circular or cylindrical profile according to given intensity and plane. - Pattern generator (or diffuser): used to generate patterns such as logo, squares, lines, circles according application needs. - Diffractive lenses: used to correct chromatic aberrations.
Encoded phase plates
Generally, they are used to alter the light plane wave passing through to generate, compensate or attenuate wave aberrations (E.g : Astronomy).
They are used also to select a specific mode in laser cavity (E.g:High Power Laser). Technologies
You need sharp alignment between fibre, laser diode, VCSEL, photodiode? We build for you reliable and small footprint silicon Micro Optical Benches that benefit from our silicon collective manufacturing processes. Technologies
Calibration standards
As nanotechnology has an increasing importance in industrial and academic activities, the demand for accurate measurement of sub-micron features is growing.
It is so for Atomic Force Microscopes (AFM) and Scanned Probe Microscopes (SPM) metrology tools which need to be calibrated with a standard to achieve higher accuracy.
Currently marketed products range from 20 to 1500 nm step height.
SILIOS Technologies has developped and patented standards for the calibration of vertical dimensions under the twenty level nanometer (down to 1 nm).
These spherical and aspherical microlenses arrays are used for laser beam homogenisation or wavefront analysers (Shack-Hartmann).
We are currently working on their development to offer this service to our customers.
