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Diffractive optics technology enables the production of DOE (Diffractive Optical Elements).
The object is to shape laser beams in defined patterns and induce new optical functions to better meet specific industrial and research applications.
Our professional engineering team takes in charge design, simulation and fabrication of the DOE. The resulting technical solutions have proven their high efficiency, reliability, reproducibility and cost effectiveness.
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Specifications:
- Binary to multilevels etched profiles (up to 512 levels)
- Wavelengths (UV to middle IR)
- Substrate size (up to Ø100 mm)
- Transmissive or reflective phase devices (quasi continuous phase profile)
- Device size (up to Ø100 mm)
- Amplitude modulation also available
- Pixel size (down to 2 µm)
Materials:
- Fused silica,
- Silicon,
- Glasses (BK7,...)
- Metals,
- Other materials on request.
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We use anisotropic etching to produce MOBs on silicon.
Applications are the realisation of supports for passive alignment of fibres, ball lenses, diodes, detectors. (e.g.: V-Grooves arrays for fibre ribbon). |
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The advantage of such a technology is to use the very accurate photolithography processes. Besides, the interesting silicon mechanical and thermal properties allow reaching a very precise alignment of micro-components. |
